Plasma etching is the core patterning process for advanced processes below 28nm, divided into CCP capacitive coupled etching for high aspect ratio dielectric etching and ICP inductive coupled etching for low-damage silicon / metal etching. It realizes nano-scale pattern transfer by physical bombardment and chemical reaction for logic chips and 3D NAND storage.
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Magnetron sputtering is essential for wafer metallization. High-energy ions bombard targets to deposit uniform metal layers such as interconnects, barrier layers and seed layers. Compatible with Al, Cu, Ti, Au and other materials for wafer manufacturing and advanced packaging.
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ESC electrostatic chucks hold wafers tightly by electrostatic force in lithography, etching and deposition tools. Stress-free full contact improves uniformity for 12-inch wafer processes including Coulomb type and J-R type.
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Full-process solutions for SiC and GaN wide-bandgap semiconductors including crystal growth, epitaxy, high-energy implantation, high-temperature annealing and high-voltage testing for new energy vehicles, PV and 5G RF devices.
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Medical X-ray diagnostic devices including DR, dental CBCT, mammography and veterinary DR generate digital imaging for orthopedics, internal medicine, dentistry and pet healthcare in hospitals and clinics.
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Electret charging implants permanent electrostatic charges into melt-blown fabric for medical masks and air filters, improving particle and virus filtration efficiency above 95% while maintaining low breathing resistance.
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Low-temperature plasma achieves efficient disinfection and wound healing for medical device sterilization, dermatology, dentistry and aesthetic treatment using active radicals and high-energy particles without thermal damage.
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Laser and picosecond aesthetic equipment use high voltage pulses to pump laser media for freckle removal, tattoo cleaning, hair removal and skin rejuvenation via photothermal and photoacoustic effects in medical beauty clinics.
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Electrostatic accelerators generate high-energy particle beams for nuclear structure research, semiconductor radiation testing and detector calibration in nuclear science universities, national key labs and nuclear industry research institutions.
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Electrospinning produces nanofibers from polymer solutions under high electrostatic fields for research on medical dressings, battery separators, filter materials, catalytic materials and functional composites in material and chemical engineering universities.
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Plasma physics experiments support low-temperature, space and fusion plasma research including DBD discharge, plasma jet, vacuum plasma, glow & corona discharge for university physics labs and plasma research institutes.
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High voltage pulse power and capacitor charge-discharge experiments are core researches for pulse power technology, electrical insulation and EMC, covering high-voltage capacitor charging, nanosecond pulse generation, withstand voltage and electromagnetic pulse simulation for university labs and power research institutes.
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Electret charging injects permanent electrostatic charge into non-woven fabrics to enhance filtration efficiency against aerosols, particles, viruses and bacteria with low airflow resistance for masks, HEPA filters and fresh air systems.
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Electrospinning fabricates nanofibers from polymer solutions under high voltage, forming high specific-area porous membranes for medical dressings, lithium battery separators, water filtration, catalytic materials and sound insulation products.
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Electrostatic dust and fume removal charges particles for collection with efficiency ≥99%, widely applied in boiler dust control, cement, metallurgy, welding smoke treatment and catering kitchen exhaust purification.
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Electrostatic painting charges atomized paint particles for uniform adhesion on grounded workpieces. Coating efficiency reaches 70%~90%, saving material while improving uniformity and adhesion for automotive parts, hardware, home appliances and steel structures.
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Electrostatic separation classifies materials by conductivity and dielectric differences via high voltage electric fields for plastic recycling, e-waste disposal, grain purification and mineral processing with over 99% purity and low energy consumption.
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Scanning Electron Microscopes provide nanoscale surface imaging for microstructure analysis, wafer defect review and chip failure analysis by focused electron beams detecting secondary and backscattered electrons in semiconductor, material and biological research.
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X-ray systems support semiconductor material characterization and non-destructive testing, including XRD crystal analysis, XRF composition measurement, industrial CT internal defect scanning and X-ray thickness gauging for thin-film metrology.
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PMT and MCP realize ultra-sensitive single-photon and single-ion detection, widely used in wafer defect inspection, SIMS, environmental chromatography, radiation monitoring, fluorescence analysis and biomedical testing with signal magnification up to 10⁶~10⁸ times.
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